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The ACV-8000/8050 is an automatic
metrology system designed for fast, precise, unattended measurement of semiconductor
features. It provides accurate measurement of registration features and critical
dimensions.
Specifications
Precision:
- Overlay Registration: <15nm 3
sigma
- Critical Dimension: <15nm 3
sigma
- Contact Hole: 30nm 3 sigma
- Tool Induced Shift (TIS): <10nm
Throughput:
- Typical: > 50-60 wafers per hour (5
meas. per wafer)
Wafer Sizes:
- Standard: 100mm, 125mm, 150mm SEMI
standard wafers
- Optional: Systems equipped with an 8"
handler are capable of handling all standard wafer sizes, as well as 200mm.
Magnifications:
- Objectives: 2.5x, 20x, 100x, and 200x
- Magnifiers: 1.25x, 1.60x, 2.00x. and 2.50x
Please contact us
so that we may answer specific questions, or provide you with more information on the
ACV-8000/8050
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The IVS-100 is an automatic metrology system designed for fast, precise, unattended
measurement of semiconductor features.It provides accurate measurement of registration
features and critical dimensions.
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IVS-100
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Specifications
Precision:
- Overlay Registration: <15nm 3
sigma
- Critical Dimension: <15nm 3
sigma
- Contact Hole: 30nm 3 sigma
- Tool Induced Shift (TIS): <10nm
Throughput:
- Typical: > 60-70 wafers per hour (5
meas. per wafer)
Wafer Sizes:
- 100mm, 125mm, 150mm, and 200mm SEMI
standard wafers
- Photomask
- Thin Film Head
Magnifications:
- Objectives: 2.5x, 20x, 100x, and 200x
- Magnifiers: 1.25x, 1.60x, 2.00x. and 2.50x
Cleanliness:
Please contact us
so that we may answer specific questions, or provide you with more information on the
IVS-100.
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IVS-120
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The IVS-120 is an automatic
metrology system designed for fast, precise, unattended measurement of semiconductor
features. It provides accurate measurement of registration features and critical
dimensions.
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Specifications
Objectives:
- Standard: 5x, 20x, and 100x
- Optional: 10x, 50x, and 150x
Cleanliness:
Wafer Sizes:
- 100mm, 125mm, 150mm, and 200mm SEMI
standard wafers.
- Photomasks
- Thin Film Heads
Cassettes:
- 3 cassette stations: 2 for production, 1
for standards
Please contact us
so that we may answer specific questions, or provide you with more information on the
IVS-120L.
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The IVS-200 Scanning Electron Microscope
(SEM) is an automatic metrology system designed for fast, precise, and unattended
measurement of semiconductor features.
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IVS-200
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The IVS-200 provides excellent submicron
measurement performance with feature range of 0.1 to 200 microns and typical measurement
precision of between 5-7nm, 3 sigma.
Specifications
CD Measurement:
- Feature Range: 0.1 to 20
microns
- Feature Types: Lines, spaces,
multiple lines and spaces
- Precision: <7 nanometers 3 sigma
dynamic repeatability or 1% whichever is greater.
Contact Hole Measurement:
- Feature types: Contact holes
and vias
- Precision: <20
nanometers 3 sigma dynamic repeatability or 1% whichever is greater.
Wafer sizes:
- 100 mm, 125mm, 150mm, and 200mm SEMI
standard wafers.
- Photomasks
- Thin film heads
Cassettes:
- 3 cassette stations: 2 for production, 1
for standards
Electron Optics:
- Schotky Field Emission
- Magnification: 100x - 200,000x
- Acceleration Voltage: 0.5 - 1.2 keV
- Resolution: 10nm at 1.0 keV
- Scan Rates: 22.5 fps, non-interlaced
- Pattern Recognition: > 99%
Please contact us
so that we may answer specific questions, or provide you with more information on the
IVS-200.
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